K-Patents PR-33-S Semicon Process Refractometer for Clean Room Enviroments

The K-Patents PR-33-S Semicon process refractometer monitors the fabrication chemical concentration in cleanroom environments and in the integrated process tools (blending, clean, etch, and CMP) in real-time. It is used to prevent wrong chemicals or wrong concentrations from entering the process tool or wet bench, to assist in optimizing the etch process, to increase wafer throughput, and to help achieve tight control of CMP slurries.

This refractometer consists of an ultra-pure, modified PTFE flow cell body and an Ethernet cable that any standard PoE (Power-over-Ethernet) switch can use to transmit power to the sensor and data to a computer. It is mounted directly in-line with a flare or pillar fitting. The PR-33-S has a compact, metal-free construction and uses only a small footprint area.

Key Specifications

  • Measurement range Refractive Index nD 1.3200–1.5300 (0-100% by weight)
  • Compact and mounted directly in-line, measurement is not influenced by particles, bubbles or turbulent flow and impurities in the ppm range
  • Provides a continuous Ethernet output signal; 4-20 mA output optional
  • Process temperature range: -20° to 85°F (-4° to 185°C)

Supporting Documentation
Click the file icon to view the file online, or right-click on the file icon and select "Save Link As..." to download the file for later viewing.

    • Type
    • Size
    • Document Name
    • K-Patents PR-33-S Bro
    • 395 KB
    • K-Patents PR-33-S Process Refractometer Brochure
    • K-Patents PR-33-S user man
    • 2.5 MB
    • K-Patents PR-33-S Process Refractometer User Manual